Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.   Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters in this part discuss topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapor monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.-Chapters review electron diffraction techniques, including the methodology for observations and measurements -Discusses the principles and applications of photoemission techniques -Examines alternative in situ characterization techniques -A standard reference for materials scientists and engineers in the electronics and photonics industries

In situ Characterization of Thin Film Growth (Woodhead Publishing in Materials) PDF

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