Content: Chemical amplification mechanisms for microlithography / E. Reichmanis, F.M. Houlihan, O. Nalamasu, and T.X. Neenan -- Synthesis of 4-(tert-butoxycarbonyl)-2,6-dinitrobenzyl tosylate : a potential generator and dissolution inhibitor solubilizable through chemical amplification / F.M. Houlihan, E. Chin, O. Nalamasu, and J.M. Kometani -- Chemically amplified deep-UV photoresists based on acetal-protected poly(vinylphenols) / Ying Jiang and David R. Bassett -- Novel analytic method of photoinduced acid generation and evidence of photosensitization via matrix resin / N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, and M. Hanabata -- Acid-catalyzed dehydration : a new mechanism for chemically amplified lithographic imaging / H. Ito, Y. Maekawa, R. Sooriyakumaran, and E.A. Mash -- An alkaline-developable positive resist based on silylated polyhydroxystyrene for KrF excimer laser lithography / Eiichi Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, and Takao Miura -- A test for correlation between residual solvent and rates of N-methylpyrrolidone absorption by polymer films / W.D. Hinsberg, S.A. MacDonald, C.D. Snyder, H. Ito, and R.D. Allen -- Dissolution rates of copolymers based on 4-hydroxystyrene and styrene / C.-P. Lei, T. Long, S.K. Obendorf, and F. Rodriguez -- Synthesis and polymerizations of N-(tert-butoxy)maleimide and application of its polymers as a chemical amplification resist / Kwang-Duk Ahn and Deok-Il Koo -- Acid-sensitive pyrimidine polymers for chemical amplification resists / Yoshiaki Inaki, Nobuo Matsumura, and Kiichi Takemoto -- Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists / R.D. Allen, G.M. Wallraff, W.D. Hinsberg, L.L. Simpson, and R.R. Kunz -- Surface-imaging resists using photogenerated acid-catalyzed SiO₂ formation by chemical vapor deposition / Masamitsu Shirai and Masahiro Tsunooka -- Polysilphenylenesiloxane resist with three-dimensional structure / K. Watanabe, E. Yano, T. Namiki, and Y. Yoneda -- Top-surface imaging using selective electroless metallization of patterned monolayer films / J.M. Calvert, W.J. Dressick, C.S. Dulcey, M.S. Chen, J.H. Georger, D.A. Stenger, T.S. Koloski, and G.S. Calabrese -- Langmuir-Blodgett deposition to evaluate dissolution behavior of multicomponent resists / V. Rao, W.D. Hinsberg, C.W. Frank, and R.F.W. Pease -- Photochemical control of a morphology and solubility transformation in poly(vinyl alcohol) films induced by interfacial contact with siloxanes and phenol-formaldehyde polymeric photoresists / James R. Sheats -- Advances in the chemistry of resists for ionizing radiation / Ralph Dammel -- Out-of-plane expansion measurements in polyimide films / Michael T. Pottiger and John C. Coburn -- Radiation-induced modifications of allylamino-substituted polyphosphazenes / M.F. Welker, H.R. Allcock, G.L. Grune, R.T. Chern, and V.T. Stannett -- Synthesis of perfluorinated polyimides for optical applications / Shinji Ando, Tohru Matsuura, and Shigekuni Sasaki -- Charged species in [sigma]-conjugated polysilanes as studied by absorption spectroscopy with low-temperature matrices / K. Ushida, A. Kira, S. Tagawa, Y. Yoshida, and H. Shibata -- Acid-sensitive phenol-formaldehyde polymeric resists / W. Brunsvold, W. Conley, W. Montgomery, and W. Moreau -- Superiority of bis(perfluorophenyl) azides over nonfluorinated analogues as cross-linkers in polystyrene-based deep-UV resists / Sui Xiong Cai, M.N. Wybourne, and John F.W. Keana -- New photoresponsive polymers bearing norbornadiene moiety : synthesis by selective cationic polymerization of 2-(3-phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl vinyl ether and photochemical reaction of the resulting polymers / T. Nishikubo, A. Kameyama, K. Kishi, and C. Hijikata -- Photoinitiated thermolysis of poly(5-norbornene 2,3-dicarboxylates) : a way to polyconjugated systems and photoresists / Ernst Zenkl, Michael Schimetta, and Franz Stelzer -- Recent progress of the application of polyimides to microelectronics / Daisuke Makino -- Base-catalyzed cyclization of ortho-aromatic amide alkyl esters : a novel approach to chemical imidization / W. Volksen, T. Pascal, J.W. Labadie, and M.I. Sanchez -- Base-catalyzed photosensitive polyimide / D.R. McKean, G.M. Wallraff, W. Volksen, N.P. Hacker, M.I. Sanchez, and J.W. Labadie -- Novel cross-linking reagents based on 3,3-dimethyl-1-phenylenetriazene / Aldrich N.K. Lau and Lanchi P. Vo -- Preparation of novel photosensitive polyimide systems via long-lived active intermediates / Takahi Yamashita and Kazuyuki Horie -- Photoregulation of liquid-crystalline orientation by anisotropic photochromism of surface azobenzenes / Yuji Kawanishi, Takashi Tamaki, and Kunihiro Ichimura -- Factors affecting the stability of polypyrrole films at higher temperatures / V.-T. Truong and B.C. Ennis -- Intrinsic and thermal stress in polyimide thin films / M. Ree and D.P. Kirby -- Fluorinated, soluble polyimides with high glass-transition temperatures based on a new, rigid, pentacyclic dianhydride : 12,14-diphenyl-12,14-bis-(trifluoromethyl)-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic dianhydride / Brian C. Auman and Swiatoslaw Trofimenko -- Processable fluorinated acrylic resins with low dielectric constants / Henry S.-W. Hu and James R. Griffith -- Enhanced processing of poly(tetrafluoroethylene) for microelectronics applications / Charles R. Davis and Frank D. Egitto -- Fluorinated poly(arylene ethers) with low dielectric constants / Frank W. Mercer, David W. Duff, Timothy D. Goodman, and Janusz B. Wojtowicz -- Microstructural characterization of thin polyimide films by positron lifetime spectroscopy / A. Eftekhari, A.K. St. Clair, D.M. Stoakley, Danny R. Sprinkle, and J.J. Singh -- Synthesis and characterization of new poly(arylene ether oxadiazoles) / Frank W. Mercer, Chris Coffin, and David W. Duff.

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